What unobstructed chemical flux would result in an, Other Engineering

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What unobstructed chemical flux would result in an

For a particular plasma etch process in which the linear etch model is applicable, a degree of anisotropy of 0.8 or better is desired.

If the unobstructed ionic flux on a flat surface is 1 X 10¹⁶ atoms cm^-2 sec^-1(with Ki equal to 1), what unobstructed chemical flux would result in an anisotropy of 0.8? For this process Sc is 0.0ⁱ and Kf is 0.1.

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