In this Chapter we have discussed several different forms of lithography (i.e. photo, electron beam, x-ray, high energy ion beam). Why do companies like Intel keep developing new lithographic techniques?
What is the wavelength regime of each of the lithographic techniques listed in Problem 9? (red-visible light, green-visible light, blue light, UV (E=SeV), e-beam (acceleration voltage of 10 keV), and x-ray).
Compare wet and dry etching in terms of its directionality, selectivity, cleanliness, feature size, and controllability.