The uniform area density of defects for a cmos fabrication
The (uniform) area density of defects for a CMOS fabrication process is 0.1 cm-2. Estimate the yield for integrated circuits with the following dimension: 4mm x 4mm, 6mm x 8mm, and 9mm x 12mm.
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What is the (approximate) maximum electric field intensity for which constant mobility may be assumed for electrons in silicon. In a digital circuit with a supply voltage of 1V, what is the corresponding gate length for MOS transistors.
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A lossless transmission line with the electrical length of l = 0.3 lamda and the characteristics impedance of Z0 = 75 is terminated with a complex load ZL = 30 -j20 calculate the reflection coeficient at the load, the SWR on the line
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