If silicon is cooled quickly, it will form a glass instead of crystallizing. One way to do this is to deposit Si atoms onto a cold substrate, with H added to remove defects; these thin films of amorphous Si (with H); these thin films of amorphous Si (with H) are used for solar cells.
a) Make a schematic drawing of an amorphous Si glass with 10%H, including about 30 atoms. (Hint: think about how many bonds Si will form, and how many bonds H would form)
b) If the H content were increased to 20%, what effect would this have on the fracture toughness of the material?