The new deposition engineer installed the company's new evaporation system. Hoping to get uniform depositions on all the wafers mounted on the inside of the spherical wafer holder, he installed the evaporation source crucible at the center of the sphere.
If the evaporation source behaves like an ideal small-area planar source, what will be the deposition rate as a function of 0, as defined below?
(Let the evaporation rate equal 3 x 10-3 gm sec-1 radius r0 equal 10 cm, and the density of the material being deposited equal 10 gat cm-3.)
Sketch a plot of d versus 9 for 0 from - 90° to + 90°, and specify the deposition rate at a point directly facing the planar source (at 0 = 0°) and at 0 - 90°.Will uniform depositions result?