An Al interconnect line has polygranular clusters that are all equal or less than 5 µm long, and a current density of 0.5 MA cm-2 is passed through it.
If the critical stress for failure is 0.4 X 109 dyne cm-2 (and let Z. equal-6).
Should this line fail due to electromigration? What is the critical current density below which electromigration failure will not occur for this line?