1. Plot the band diagram of an ideal MOS diode with n-type substrate at VG = VT.
2. Plot the band diagram of an n*-polysilicon-gated MOS diode with p-type substrate at flat-band condition.
3. For a metal-SiO2-Si capacitor having NA = 5 x 1016 cm-3, calculate the maximum width of surface depletion region.
4. For an ideal Si-SiO2 MOS diode with d = 5 nm, NA = 1017 cm-3, find the applied voltage and the electric field at the interface required to make the silicon surface intrinsic.