An implanted profile is formed by two boron implantations. The first one uses energy of 100 keV and the second one, an energy of 200 keV. The peak concentration of each distribution is 5 x 1018 /cm3.
Draw a graph of the composite profile and find the junction depth(s) if the phosphorus background concentration is 10 1 6 /cm3. What are the doses of the two implant steps?