Does the scenario above satisfy the frensel limit


Problem 1: What is the minimum feature size achievable using proximity lithography with a 1 μm gap in conjunction with a k = 0.8 photoresist and a 248 nm light source?

Problem 2: Does the scenario above satisfy the Frensel limit?

Problem 3: Using the same laser and resist, what is the minimum gap size required for proximity lithography to have better resolution than a projection lithography system using water immersion optics (NA = 1.4)?

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Other Subject: Does the scenario above satisfy the frensel limit
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