Problem 1: What is the minimum feature size achievable using proximity lithography with a 1 μm gap in conjunction with a k = 0.8 photoresist and a 248 nm light source?
Problem 2: Does the scenario above satisfy the Frensel limit?
Problem 3: Using the same laser and resist, what is the minimum gap size required for proximity lithography to have better resolution than a projection lithography system using water immersion optics (NA = 1.4)?