Please find the answer of all parts of the following question
Question- You've deposited a 10-7 cm layer of al on si to make a semiconductor device.
Part 1- Determine the surface concentration after annealing for 100s with d= 10-12 cm2/s. given that si chips are .05cm thick, would this solution be useful at 105s? Explain.
I want help to compute the surface concentration after annealing.