To compare two photolithography processes (A and B), 4 of 8 wafers were randomly assigned to each. The electrically measured line width of several NMOS transistors gave the following averages (in µm):
![2320_eed81bef-3e33-416a-95f8-6bcf930efc5c.png](https://secure.tutorsglobe.com/CMSImages/2320_eed81bef-3e33-416a-95f8-6bcf930efc5c.png)
Assuming that the processes have the same standard deviation, calculate the significance for the comparison of means.