Assume that the gate oxide between an n+ poly-Si gate and the p-substrate is II A thick and Na = lEI8 cm3.
(a) What is the VI of this device?
(b) What is the subthreshold swing, S?
(c) What is the maximwn leakage current if W = I µm. L = 18 nm? (Assume Ids = 100 W/L (nA) at Vg = Vt.)